Wafer Defect Detection Using Directional Morphological Gradient Techniques
نویسندگان
چکیده
منابع مشابه
Wafer Defect Detection Using Directional Morphological Gradient Techniques
Accurate detection and classification of wafer defects constitute an important component of the IC production process because together they can immediately improve the yield and also provide information needed for future process improvements. One class of inspection procedures involves analyzing surface images. Because of the characteristics of the design patterns and the irregular size and sha...
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ژورنال
عنوان ژورنال: EURASIP Journal on Advances in Signal Processing
سال: 2002
ISSN: 1687-6180
DOI: 10.1155/s1110865702204035